DSpace@nitr >
National Institue of Technology- Rourkela >
Conference Papers >

Please use this identifier to cite or link to this item: http://hdl.handle.net/2080/333

Title: Total Concentration Approach for Three-Dimensional Diffusion-Controlled Wet Chemical Etching
Authors: Rath, P
Chai, J C
Zheng, H
Lam, Y C
Murukeshan, V M
Issue Date: 2006
Publisher: Elsevier
Citation: International Journal of Heat and Mass Transfer, Vol 49, P 3408-3416
Abstract: A total concentration fixed-grid method is used in this article to model the three-dimensional diffusion-controlled wet chemical etching. A total concentration is defined as the sum of the unreacted and the reacted etchant concentrations. The governing mass diffusion equation based on the total concentration includes the interface condition. The reacted concentration of etchant is a measure of the etchfront position. With this approach the etchfront can be found implicitly. For demonstration purposes, the finite-volume method is used to solve the resulting set of governing equations with initial and boundary conditions. The effect of mask thickness on the etchfront surface evolution is studied. The condition at which a three-dimensional etching is converted into two-dimensional is also presented.
Description: Copyright for this article belongs to Elsevier.
URI: http://hdl.handle.net/2080/333
Appears in Collections:Conference Papers

Files in This Item:

File Description SizeFormat
rath1.pdf898KbAdobe PDFView/Open

Show full item record

All items in DSpace are protected by copyright, with all rights reserved.

 

Powered by DSpace Feedback