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http://hdl.handle.net/2080/1313
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| Title: | Effect of plating parameters on the magnetic structure distribution in electrodeposited Co/Cu alloy films by Magnetic Force Microscope |
| Authors: | Mallik, A
Das, A |
| Keywords: | Co/Cu alloy
Magnetic Force Microscope (MFM)
Electrodeposition
Cyclic voltammetry |
| Issue Date: | 2010 |
| Publisher: | American Scientific Publisher |
| Citation: | Journal of Advanced Microscopy Research Vol. 5, 1–9, 2010 |
| Abstract: | Co-Cu alloys were electrodeposited with varying applied potential and Cu concentration on
graphite from sulphate bath. Electrochemical characterization was investigated by cyclic
voltammetry (CV) and chronoamperometry (CA). It was found that the nucleation time for alloy
deposition was shorter for high negative potential and low Cu concentration in the depositing
bath. Alloy morphology and composition were determined by using scanning electron
microscopy (SEM)/energy dispersive spectroscopy (EDS). SEM micrographs revealed a
transition of branched dendritic structures to well covered, agglomerated and compact alloy
morphology with reduced Cu concentrations in the depositing bath. Magnetic Force Microscopy
technique made possible to detect changes on the magnetic phase distribution between different
Cu concentrations and applied potential in the alloy film. The magnetic domains were found to
be bigger at high Cu concentrations and low deposition potential. The magnetization of ... |
| Description: | Copyright for this article belongs to American Scientific Publishers. |
| URI: | http://hdl.handle.net/2080/1313 |
| Appears in Collections: | Journal Articles
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| JAMR.pdf | | 87Kb | Adobe PDF | View/Open |
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