Electrochemical Synthesis Of Cu Thin Films Under Ultrasonic Irradiation: The Effect On Ex-situ Growth Behavior

Please use this identifier to cite or link to this item: http://hdl.handle.net/2080/1133

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DC Field	Value	Language
dc.contributor.author	Rout, S	-
dc.contributor.author	Mallik, A	-
dc.contributor.author	Ray, B C	-
dc.date.accessioned	2010-01-12T07:38:31Z	-
dc.date.available	2010-01-12T07:38:31Z	-
dc.date.issued	2010	-
dc.identifier.citation	International Conference on Recent Trends in Materials and Characterization (RETMAC -2010) February 14 – 15, 2010, National Institute of Technology, Suratkal, Karnataka.	en
dc.identifier.uri	http://hdl.handle.net/2080/1133	-
dc.description.abstract	The nucleation and growth phenomena taking place under the impact of intense ultrasonic field during deposition of copper films onto graphite substrate from sulphate bath has been investigated. A comparative study of crystallinity, composition and ex-situ growth behavior of the as-deposited copper thin films and similar films prepared under ultrasonic irradiation are carried out. The thermodynamics and kinetics of the growth behaviour studied, utilizing calorimetric techniques.	en
dc.format.extent	8139769 bytes	-
dc.format.mimetype	application/pdf	-
dc.language.iso	en	-
dc.subject	Copper,	en
dc.subject	Electrodeposition,	en
dc.subject	Thin-film,	en
dc.subject	Ultrasound,	en
dc.subject	Growth	en
dc.title	Electrochemical Synthesis Of Cu Thin Films Under Ultrasonic Irradiation: The Effect On Ex-situ Growth Behavior	en
dc.type	Article	en
Appears in Collections:	Conference Papers

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